Developer for Photopolymer Resist 290 grams

Developer for photopolymer film F4000 and photo-imageable Etch Resist R1000
€ 5,03
€ 16,76 per 1 kg
incl. 19% VAT , plus shipping costs
  • Available immediately
  • Delivery time: 2 - 3 Workdays (Other countries)
Developer for photopolymer film F4000 and photo imageable Etch Resist R1000. Make a solution with 1% of developer in water ( e.g. solve 10 gram developer in 1 liter water ). Develop the laminated material for at least 1 minute till all residue of developed film has solved and brush the surface gently with a sponge. Rinse for 1.5 minutes in cold tap water. Dry with a hot air gun or fan.
Shipping weight: 0,40 kg
Content: 300,00 g