Developer for Photopolymer Resist

Item number: R1200

Developer for photopolymer film F4000 and photo-imageable Etch Resist R1000

Category: Liquid Photoresist


starting from € 5,03
€ 16,76 per 1 kg

including19% VAT., plus shipping

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There are variations of this item. Please select the variation you wish.


Developer for photopolymer film F4000 and photo imageable Etch Resist R1000. Make a solution with 1% of developer in water ( e.g. solve 10 gram developer in 1 liter water ). Develop the laminated material for at least 1 minute till all residue of developed film has solved and brush the surface gently with a sponge. Rinse for 1.5 minutes in cold tap water. Dry with a hot air gun or fan.

Contents:0,30 kg