Developer for Photopolymer Resist
Developer for photopolymer film F4000 and photo imageable Etch Resist R1000. Make a solution with 1% of developer in water ( e.g. solve 10 gram developer in 1 liter water ). Develop the laminated material for at least 1 minute till all residue of developed film has solved and brush the surface gently with a sponge. Rinse for 1.5 minutes in cold tap water. Dry with a hot air gun or fan.