Set of Liquid Photoresist R1000 & Developer
with high resolution and fast exposure . Best choice for the production of printing plates for intaglio ( photo etching | photogravure ), to etch pcbs in electronics and for detailed etching of brass and other metals in model making.Specs:
With Liquid Photo-Imageable Etch Resist R1000 fast, precise and reliable results can be achived.
The necessary steps are described sequentially.
Clean the surface of the material that should be coated with resist. The surface ought to be dust and grease free.
Pour a small amount of photo resist on the plate and use a doctor blade or a grooved rod to roll out a homogenous thin film of resist. Dry with a hot air fan or in a drying oven for about 5 minutes untill all exhalable contents have gone and the surface becomes matte. After that the plate should be allowed to dry for at least one hour in darkness.
Given that the resist is negative acting, all parts that should be etched must be prevented from exposure so that the resist can be washed away in those areas during development. This is achieved by either paint directly on the surface of the resist with a black sharpie pen or by printing out a positive with an inkjet printer. For printing a positive a wide range of trasparencies is suitable. Best results can be achieved by using repro film for screenprinting. Printer driver settings are: Photo Glossy Paper and black/white to obtain an opaque transparency. If You don't have an exposure unit or vacuum frame, You should use a picture frame glass and a soft backing and press the transparency and laminated plate between to ensure tight contact between the positive (transparency) and the film surface .
Light sources can be everything that emmitts uv-light: terrarium lamps, work spot lights, exposure units and last but not least simply the sun. Exposing in the sun produces very precise and good results as long as the different exposure times are determined ( seasons, daytime )
Exposure time in Juli from 12 - 20 o'clock : 35 seconds
Prepare a solution of 1 percent of developer and water ( e.g. 1 liter water + 10 gram developer ) in a tray and put the plate into the developer. Leave it in there for at least 1 minute. The unexposed parts are solved by the developer. If all residue is removed, pull out the plate and rinse in cold tap water for about 1.5 minutes.
After development the photo resist has to be dried with a fan or hot air gun for about 2 minutes and then hardened under uv-light for 5 to 10 minutes. The plate is now ready for etching. After etching the plate the resist can be removed in a solution of 10 % developer in hot water or a 5 % solution of stripper in water. The coating is also soluble in alcohol or acetone.
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